What is the new service offered by Toray Research Center?

Toray Research Center has launched a new contract analysis service for detecting and quantifying impurity metallic nanoparticles in chemical solutions used in semiconductor manufacturing. This service utilizes a highly optimized single-nanoparticle inductively coupled plasma mass spectrometry (spICP-MS) technique.

Why is the analysis of nanoparticles in semiconductor chemical solutions important?

As semiconductor devices become smaller and more complex, even trace amounts of nanoparticles in the nanometer range can cause critical defects like disconnections and short circuits, leading to reduced device reliability and lower manufacturing yields. Therefore, strict purity control of the chemical solutions used is essential.

What makes Toray Research Center's technology unique or advanced?

TRC has achieved the highest sensitivity in Japan by highly optimizing sample preparation methods and measurement conditions for spICP-MS. Their unique analysis system, combined with high-purity solvents and rigorous operational management, allows for the sensitive and stable detection of extremely trace amounts of impurity nanoparticles.

spICP-MS stands for single-nanoparticle inductively coupled plasma mass spectrometry. It is a highly sensitive analytical method capable of detecting and simultaneously measuring the size and particle number concentration of individual metallic nanoparticles in a liquid sample.

What kind of nanoparticles can be analyzed?

The service focuses on metallic nanoparticles that act as impurities in semiconductor manufacturing chemical solutions. The technology can also be applied to evaluate metallic nanoparticles contained within resins by dissolving them in appropriate solvents.

What are the expected benefits of this service?

This service is expected to contribute to the further high-purity of chemical solutions used in semiconductor manufacturing and to improve yields in the production of advanced semiconductors by identifying and quantifying critical nanoparticle contaminants.

What is PGMEA and why is it mentioned in the example?

PGMEA (propylene glycol monomethyl ether acetate) is a chemical commonly used as a solvent for photoresists and as a cleaning agent in semiconductor manufacturing. The example demonstrates that even commercially available 'high-purity' PGMEA can contain detectable metallic nanoparticles, highlighting the need for TRC's sensitive analysis service.

AI News NQ Analysis

東レ研究中心推出高靈敏度半導體藥液奈米粒子分析服務，支援 AI 時代半導體需求擴大

NQ 評分 50/100

AI 摘要（NQ 加工版）

東レリサーチセンター（Toray Research Center）推出一項針對半導體藥液中金屬奈米粒子進行高靈敏度分析的新服務。

尚無 AI 分析資料。

常見問題

Q: What is the new service offered by Toray Research Center?: A: Toray Research Center has launched a new contract analysis service for detecting and quantifying impurity metallic nanoparticles in chemical solutions used in semiconductor manufacturing. This service utilizes a highly optimized single-nanoparticle inductively coupled plasma mass spectrometry (spICP-MS) technique.
Q: Why is the analysis of nanoparticles in semiconductor chemical solutions important?: A: As semiconductor devices become smaller and more complex, even trace amounts of nanoparticles in the nanometer range can cause critical defects like disconnections and short circuits, leading to reduced device reliability and lower manufacturing yields. Therefore, strict purity control of the chemical solutions used is essential.
Q: What makes Toray Research Center's technology unique or advanced?: A: TRC has achieved the highest sensitivity in Japan by highly optimizing sample preparation methods and measurement conditions for spICP-MS. Their unique analysis system, combined with high-purity solvents and rigorous operational management, allows for the sensitive and stable detection of extremely trace amounts of impurity nanoparticles.
Q: What is spICP-MS?: A: spICP-MS stands for single-nanoparticle inductively coupled plasma mass spectrometry. It is a highly sensitive analytical method capable of detecting and simultaneously measuring the size and particle number concentration of individual metallic nanoparticles in a liquid sample.
Q: What kind of nanoparticles can be analyzed?: A: The service focuses on metallic nanoparticles that act as impurities in semiconductor manufacturing chemical solutions. The technology can also be applied to evaluate metallic nanoparticles contained within resins by dissolving them in appropriate solvents.
Q: What are the expected benefits of this service?: A: This service is expected to contribute to the further high-purity of chemical solutions used in semiconductor manufacturing and to improve yields in the production of advanced semiconductors by identifying and quantifying critical nanoparticle contaminants.
Q: What is PGMEA and why is it mentioned in the example?: A: PGMEA (propylene glycol monomethyl ether acetate) is a chemical commonly used as a solvent for photoresists and as a cleaning agent in semiconductor manufacturing. The example demonstrates that even commercially available 'high-purity' PGMEA can contain detectable metallic nanoparticles, highlighting the need for TRC's sensitive analysis service.