关于参加「Photomask Japan 2026 技术展览会 第32届光罩技术展示会」
Key facts
- 关于参加「Photomask Japan 2026 技术展览会 第32届光罩技术展示会」
- NuFlare Technology 将在「Photomask Japan 2026」展出最新的描绘与检测设备。
- Date: Mon Mar 30 2026 20:53:43 GMT+0900 (Japan Standard Time)
Direct answer
NuFlare Technology 将在「Photomask Japan 2026」展出最新的描绘与检测设备。
- Citation
- 关于参加「Photomask Japan 2026 技术展览会 第32届光罩技术展示会」 (Mon Mar 30 2026 20:53:43 GMT+0900 (Japan Standard Time)), PR TIMES
- Source
- PR TIMES
- Date
- Mon Mar 30 2026 20:53:43 GMT+0900 (Japan Standard Time)
尚無 AI 分析資料。
常見問題
- Q: What is Photomask Japan 2026 Technical Exhibition?
- A: Photomask Japan 2026 Technical Exhibition is an international symposium and exhibition focused on photomask and next-generation lithography mask technologies.
- Q: Which company is exhibiting at Photomask Japan 2026?
- A: NuFlare Technology Inc. (NFT) is exhibiting at the event.
- Q: What products will NuFlare Technology be showcasing?
- A: NuFlare Technology will showcase the MBM™-4000 (multi-electron beam mask drawing system) and the NPI-8000 series (mask inspection system), along with their product roadmaps.
- Q: What are the key features of the MBM™-4000?
- A: The MBM™-4000 is designed to support mass production of semiconductor manufacturing masks for the A14 node.
- Q: What are the key features of the NPI-8000 series?
- A: The NPI-8000 series offers high-speed mask inspection (under 60 minutes) for semiconductor manufacturing masks from 10/7nm to mature nodes, using simultaneous transmission and reflection inspection.
- Q: When and where is the exhibition taking place?
- A: The exhibition is held on April 9th (10:00–17:00) and 10th (10:00–16:00), 2026, at Pacifico Yokohama Annex Hall, Booth No. 31.
- Q: What technological strengths does NuFlare Technology possess?
- A: NuFlare Technology possesses both electron beam technology (for drawing systems) and optical technology (for inspection systems).