What material did Patentix Inc. deposit on a 6-inch Si wafer in collaboration with JTEKT Thermo System Corporation?

Patentix Inc. deposited rutile germanium dioxide (r-GeO₂) on a 6-inch Si wafer.

Which company collaborated with Patentix Inc. to develop the deposition system for 6-inch substrates?

JTEKT Thermo System Corporation collaborated with Patentix Inc. on the deposition system.

What is the crystal structure of the germanium dioxide film deposited by Patentix Inc. in 2024?

The crystal structure of the deposited film is rutile germanium dioxide (r-GeO₂).

On what size substrate did Patentix Inc. successfully deposit r-GeO₂ thin film in 2024?

Patentix Inc. successfully deposited r-GeO₂ thin film on a 6-inch Si substrate.

When is Patentix Inc. targeting sample prototyping for mass production of power devices using r-GeO₂?

Patentix Inc. is targeting sample prototyping for 2027.

AI News NQ Analysis

Successful Deposition of Rutile Germanium Dioxide (r-GeO₂) Thin Film on 6-inch Si Substrate

NQ Score 88/100

N1 Content Completeness 90

AI Summary (NQ-processed)

Patentix Inc., in collaboration with JTEKT Thermo System Corporation, has successfully developed a new deposition system compatible with 6-inch substrates and deposited a thin film of rutile germanium dioxide (r-GeO₂), a next-generation power semiconductor material, on a 6-inch Si wafer. This marks a significant step towards realizing large-diameter substrates necessary for mass production of power devices, with sample prototyping targeted for 2027.

AI Analysis

Frequently Asked Questions

Q: What material did Patentix Inc. deposit on a 6-inch Si wafer in collaboration with JTEKT Thermo System Corporation?: A: Patentix Inc. deposited rutile germanium dioxide (r-GeO₂) on a 6-inch Si wafer.
Q: Which company collaborated with Patentix Inc. to develop the deposition system for 6-inch substrates?: A: JTEKT Thermo System Corporation collaborated with Patentix Inc. on the deposition system.
Q: What is the crystal structure of the germanium dioxide film deposited by Patentix Inc. in 2024?: A: The crystal structure of the deposited film is rutile germanium dioxide (r-GeO₂).
Q: On what size substrate did Patentix Inc. successfully deposit r-GeO₂ thin film in 2024?: A: Patentix Inc. successfully deposited r-GeO₂ thin film on a 6-inch Si substrate.
Q: When is Patentix Inc. targeting sample prototyping for mass production of power devices using r-GeO₂?: A: Patentix Inc. is targeting sample prototyping for 2027.