AndTech to Hold WEB Online Zoom Seminar on May 14 (Thursday): "Overview of Semiconductor CMP Technology, Material Removal Mechanisms, Trends in Abrasive Particle Development and Slurry Dispersibility Evaluation, and Characteristics of Post-Cleaning"
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AndTech Co., Ltd. will hold a WEB online Zoom seminar on May 14, 2026, focusing on semiconductor CMP technology. This seminar aims to address the growing needs for solutions in semiconductor CMP technology, featuring leading experts who will explain the overview of CMP/cleaning processes, material removal mechanisms, abrasive particle development, slurry dispersibility evaluation, and post-cleaning characteristics.